iPUMA-LE is a 12-inch high-current ion implanter with horizontal ribbon beam developed by Hwatsing, which has evolved the beam from a mature vertical ribbon beam in accordance with the requirements of advanced industry technologies. The equipment uses advanced beam gradient technology. It intergrates magnetic field and electric field modules?,and it is equipped with precise measurement technology, demonstrating excellent ion selectivity capability and accuracy? to meet the demands of various process technologies. The equipment has been applied in semiconductor manufacture.
Horizontal ion beam gradient technology
Dual-selectivity technology by magnetic and electric field
The beam tuning capability demonstrates domestically leading performance??
Configurable for various process technologies in semiconductor